Atomic layer etching (ALE) is a promising technique with atomic-level thickness controllability and high selectivity based on self-limiting surface reactions. ALE is performed by sequential exposure of the film surface to reactants, which results in surface modification and release of volatile species. Among the various ALE methods, thermal ALE involves a thermally activated reaction by employing gas species to release the modified surface without using energetic species, such as accelerated ions and neutral beams. In this study, the basic principle and surface reaction mechanisms of thermal ALE?processes, including “fluorination-ligand exchange reaction”, “conversion-etch reaction”, “conversion-fluorination reaction”, “oxidation-fluorination reaction”, “oxidation-ligand exchange reaction”, and “oxidation-conversion-fluorination reaction” are described. In addition, the reported thermal ALE processes for the removal of various oxides, metals, and nitrides are presented.

It is necessary to fabricate uniformly dispersed nanoscale catalyst materials with high activity and long-term stability for polymer electrolyte membrane fuel cells with excellent electrochemical characteristics of the oxygen reduction reaction and hydrogen oxidation reaction. Platinum is known as the best noble metal catalyst for polymer electrolyte membrane fuel cells because of its excellent catalytic activity. However, given that Pt is expensive, considerable efforts have been made to reduce the amount of Pt loading for both anode and cathode catalysts. Meanwhile, the atomic layer deposition (ALD) method shows excellent uniformity and precise particle size controllability over the three-dimensional structure. The research progress on noble metal ALD, such as Pt, Ru, Pd, and various metal alloys, is presented in this review. ALD technology enables the development of polymer electrolyte membrane fuel cells with excellent reactivity and durability.

Atomic layer deposition (ALD) is widely used as a tool for the formation of near-atomically flat and uniform thin films in the semiconductor and display industries because of its excellent uniformity. Nowadays, ALD is being extensively used in diverse fields, such as energy and biology. By controlling the reactivity of the surface, either homogeneous or inhomogeneous coating on the shell of nanostructured powder can be accomplished by the ALD process. However, the ALD process on the powder largely depends on the displacement of powder in the reactor. Therefore, the technology for the fluidization of the powder is very important to redistribute its position during the ALD process. Herein, an overview of the three types of ALD reactors to agitate or fluidize the powder to improve the conformality of coating is presented. The principle of fluidization its advantages, examples, and limitations are addressed.

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• High-performance of ZnO/TiO2 heterostructured thin-film photocatalyst fabricated via atomic layer deposition
  Ji Young Park, Jeong Hwan Han, Byung Joon Choi
  Journal of Vacuum Science & Technology A.2024;[Epub]     CrossRef
• TiO2 Thin Film Coating on an Nb-Si–Based Superalloy via Atomic Layer Deposition
  Ji Young Park, Su Min Eun, Jongmin Byun, Byung Joon Choi
  journal of Korean Powder Metallurgy Institute.2024; 31(3): 255.     CrossRef
• Atomic layer deposition of ZnO layers on Bi2Te3 powders: Comparison of gas fluidization and rotary reactors
  Myeong Jun Jung, Myeongjun Ji, Jeong Hwan Han, Young-In Lee, Sung-Tag Oh, Min Hwan Lee, Byung Joon Choi
  Ceramics International.2022; 48(24): 36773.     CrossRef

The design and fabrication of photoelectrochemical (PEC) electrodes for efficient water splitting is important for developing a sustainable hydrogen evolution system. Among various development approaches for PEC electrodes, the chemical vapor deposition method of atomic layer deposition (ALD), based on self-limiting surface reactions, has attracted attention because it allows precise thickness and composition control as well as conformal coating on various substrates. In this study, recent research progress in improving PEC performance using ALD coating methods is discussed, including 3D and heterojunction-structured PEC electrodes, ALD coatings of noble metals, and the use of sulfide materials as co-catalysts. The enhanced long-term stability of PEC cells by ALD-deposited protecting layers is also reviewed. ALD provides multiple routes to develop improved hydrogen evolution PEC cells.

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• Improved Interface and Electrical Properties by Inserting an Ultrathin SiO2 Buffer Layer in the Al2O3/Si Heterojunction
  Doyeon Kim, Jae‐Young Choi, Sang Wook Ryu, Woo‐Byoung Kim
  Advanced Functional Materials.2019;[Epub]     CrossRef