Atomic layer deposition (ALD) is a promising technology for the uniform deposition of thin films. ALD is based on a self-limiting mechanism, which can effectively deposit thin films on the surfaces of powders of various sizes. Numerous studies are underway to improve the performance of thermoelectric materials by forming core-shell structures in which various materials are deposited on the powder surface using ALD. Thermoelectric materials are especially relevant as clean energy storage materials due to their ability to interconvert between thermal and electrical energy by the Seebeck and Peltier effects. Herein, we introduce a surface and interface modification strategy based on ALD to control the performance of thermoelectric materials. We also discuss the properties of the interface between various deposition materials and thermoelectric materials.
To improve the mechanical properties of aluminum, graphene has been used as a reinforcing material, yielding graphene-reinforced aluminum matrix composites (GRAMCs). Dispersion of graphene materials is an important factor that affects the properties of GRAMCs, which are mainly manufactured by mechanical mixing methods such as ball milling. However, the use of only mechanical mixing process is limited to achieve homogeneous dispersion of graphene. To overcome this problem, in this study, we have prepared composite materials by coating aluminum particles with graphene by a self-assembly reaction using poly vinylalcohol and ethylene diamine as coupling agents. The scanning electron microscopy and Fourier-transform infrared spectroscopy results confirm the coating of graphene on the Al surface. Bulk density of the sintered composites by spark plasma sintering achieved a relative density of over 99% up to 0.5 wt.% graphene oxide content.
Atomic layer deposition (ALD) is widely used as a tool for the formation of near-atomically flat and uniform thin films in the semiconductor and display industries because of its excellent uniformity. Nowadays, ALD is being extensively used in diverse fields, such as energy and biology. By controlling the reactivity of the surface, either homogeneous or inhomogeneous coating on the shell of nanostructured powder can be accomplished by the ALD process. However, the ALD process on the powder largely depends on the displacement of powder in the reactor. Therefore, the technology for the fluidization of the powder is very important to redistribute its position during the ALD process. Herein, an overview of the three types of ALD reactors to agitate or fluidize the powder to improve the conformality of coating is presented. The principle of fluidization its advantages, examples, and limitations are addressed.
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We report a synthesis of non-toxic InP nanocrystals using non-pyrolytic precursors instead of pyrolytic and unstable tris(trimethylsilyl)phosphine, a popular precursor for synthesis of InP nanocrystals. In this study, InP nanocrystals are successfully synthesized using hexaethyl phosphorous triamide (HPT) and the synthesized InP nanocrystals showed a broad and weak photoluminescence (PL) spectrum. As synthesized InP nanocrystals are subjected to further surface modification process to enhance their stability and photoluminescence. Surface modification of InP nanocrystals is done at 230°C using 1-dodecanethiol, zinc acetate and fatty acid as sources of ZnS shell. After surface modification, the synthesized InP/ZnS nanocrystals show intense PL spectra centered at the emission wavelength 612 nm through 633 nm. The synthesized InP/ZnS core/shell structure is confirmed with X-ray diffraction (XRD) and Inductively Coupled Plasma - Atomic Emission Spectrometer (ICP-AES). After surface modification, InP/ZnS nanocrystals having narrow particle size distribution are observed by Field Emission Transmission Electron Microscope (FE-TEM). In contrast to uncapped InP nanocrystals, InP/ZnS nanocrystals treated with a newly developed surface modified procedure show highly enhanced PL spectra with quantum yield of 47%.
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This paper describes the surface modification effect of a Ti substrate for improved dispersibility of the catalytic metal. Etching of a pure titanium substrate was conducted in 50% H2SO4, 50°C for 1 h-12 h to observe the surface roughness as a function of the etching time. At 1 h, the grain boundaries were obvious and the crystal grains were distinguishable. The grain surface showed micro-porosities owing to the formation of micro-pits less than 1 μm in diameter. The depths of the grain boundary and micro-pits appear to increase with etching time. After synthesizing the catalytic metal and growing the carbon nano tube (CNT) on Ti substrate with varying surface roughness, the distribution trends of the catalytic metal and grown CNT on Ti substrate are discussed from a micro-structural perspective.
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