The improvement of dispersion stability for the primary polishing slurry in a CMP process is achieved to prevent defects produced by agglomeration of the slurry. The dispersion properties are analyzed according to the physical characteristics of each silica sol sample. Further, the difference in the dispersion stability is confirmed as the surfactant content. The dispersibility results measured by Zeta potential suggest that the dispersion properties depend on the content and size of the abrasive in the primary polishing slurry. Moreover, the optimum ratio for high dispersion stability is confirmed as the addition content of the surfactant. Based on the aforementioned results, the long-term stability of each slurry is analyzed. Turbiscan analysis demonstrates that the agglomeration occurs depending on the increasing amount of surfactant. As a result, we demonstrate that the increased particle size and the decreased content of silica improve the dispersion stability and long-term stability.
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Cobalt coated tungsten carbide-cobalt composite powder has been prepared through wet chemical reduction method. The cobalt sulfate solution was converted to the cobalt chloride then the cobalt hydroxide. The tungsten carbide powders were added in to the cobalt hydroxide, the cobalt hydroxide was reduced and coated over tungsten carbide powder using hypo-phosphorous acid. Both the cobalt and the tungsten carbide phase peaks were evident in the tungsten carbide-cobalt composite powder by X-ray diffraction. The average particle size measured via scanning electron microscope, particle size analysis was around 380 nm and the thickness of coated cobalt was determined to be 30~40 nm by transmission electron microscopy.
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